Princeton University Library Catalog

Molecular theory of lithography / by Uzodinma Okoroanyanwu.

Author:
Okoroanyanwu, Uzodinma [Browse]
Format:
Book
Language:
English
Published/​Created:
[Bellingham, Washington (1000 20th St. Bellingham WA 98225-6705 USA): SPIE, 2015]
Description:
1 online resource (xix, 469 pages).
Series:
SPIE Press monograph ; PM255. [More in this series]
Summary note:
This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics.
Bibliographic references:
Includes bibliographical references and index.
Source of description:
Title from PDF title page (SPIE eBooks Website, viewed 2015-11-13).
Contents:
Preface -- Acronyms and abbreviations -- 1. Overview of lithography -- 2. Theory of the lithographic process -- 3. Theory of molecular interactions in lithography -- 4. Theory of photochemical and radiochemical lithographic imaging mechanisms -- 5. Theory of block copolymer self-assembly lithographic imaging mechanisms -- 6. Theory of imprint lithographic imaging mechanisms -- Index.
Subject(s):
ISBN:
  • 9781628415520 electronic
  • 1628415525 electronic
  • 1628415517
  • 9781628415513
Doi:
  • 10.1117/3.2179925
Publisher:
Other views:
Staff view