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Princeton University Library Catalog
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Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE [and others].
Format
Book
Language
English
Published/Created
Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1995.
Description
xi, 554 pages : illustrations ; 28 cm.
Availability
Available Online
SPIE Digital Library Proceedings
Copies in the Library
Location
Call Number
Status
Location Service
Notes
ReCAP - Remote Storage
TK7874 .P5672 1995
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Details
Subject(s)
Masks (Electronics)
—
Congresses
[Browse]
Integrated circuits
—
Masks
—
Congresses
[Browse]
X-ray lithography
—
Congresses
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Microlithography
—
Congresses
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Related name
Photomask Japan
[Browse]
BACUS (Technical group)
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Society of Photo-Optical Instrumentation Engineers
[Browse]
Yoshihara, Hideo
[Browse]
Series
Proceedings of SPIE--the International Society for Optical Engineering ; v. 2512.
[More in this series]
SPIE proceedings series ; v. 2512
Notes
"...invited and contributed papers presented at Photomask Japan '95 held at the Kanagawa Science Park in Kawasaki, Japan, on 20-21 April 1995"--P. xi.
Bibliographic references
Includes bibliographic references and author index.
Contents
Photomask process and materials
X-ray mask
Equipment and metrology
Phase-shift mask and optical proximity correction
Inspection, repair, design, automation, and management.
Show 2 more Contents items
ISBN
0819418706 ((pbk.))
9780819418708 ((pbk.))
LCCN
95067866
OCLC
32906947
Statement on language in description
Princeton University Library aims to describe library materials in a manner that is respectful to the individuals and communities who create, use, and are represented in the collections we manage.
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Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan
id
99125113083906421
Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan ; BACUS ; SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE [and others].
id
SCSB-3275090