Princeton University Library Catalog

Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, chair/editor ; sponsored by Photomask Japan ; BACUS ; SPIE--the International Society for Optical Engineering ... [et al.].

Format:
Book
Language:
English
Published/​Created:
[Bellingham, Wash: SPIE, c1995]
Description:
xi, 554 p. : ill. ; 28 cm.
Series:
  • Proceedings of SPIE--the International Society for Optical Engineering ; v. 2512. [More in this series]
  • Proceedings / SPIE--the International Society for Optical Engineering ; v. 2512
Notes:
"...invited and contributed papers presented at Photomask Japan '95 held at the Kanagawa Science Park in Kawasaki, Japan, on 20-21 April 1995"--P. xi.
Bibliographic references:
Includes bibliographic references and author index.
Subject(s):
ISBN:
0819418706
LCCN:
95067866
OCLC:
32906947
Related name:
Other views:
Staff view