Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; cosponsored by Japan Chapter of SPIE [and others].

Format
Book
Language
English
Published/​Created
Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1995.
Description
xi, 554 pages : illustrations ; 28 cm.

Availability

Copies in the Library

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ReCAP - Remote StorageTK7874 .P5672 1995 Browse related items Request

    Details

    Subject(s)
    Series
    • Proceedings of SPIE--the International Society for Optical Engineering ; v. 2512. [More in this series]
    • SPIE proceedings series ; v. 2512
    Notes
    "...invited and contributed papers presented at Photomask Japan '95 held at the Kanagawa Science Park in Kawasaki, Japan, on 20-21 April 1995"--P. xi.
    Bibliographic references
    Includes bibliographic references and author index.
    Contents
    • Photomask process and materials
    • X-ray mask
    • Equipment and metrology
    • Phase-shift mask and optical proximity correction
    • Inspection, repair, design, automation, and management.
    ISBN
    • 0819418706 ((pbk.))
    • 9780819418708 ((pbk.))
    LCCN
    95067866
    OCLC
    32906947
    Statement on language in description
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