Handbook of thin film technology / Hartmut Frey, Hamid R. Khan, editors.

Format
Book
Language
English
Published/​Created
Berlin : Springer, [2015]
Description
xiii, 379 pages : illustrations ; 26 cm

Availability

Copies in the Library

Location Call Number Status Location Service Notes
Harold P. Furth Plasma Physics Library - Stacks TA418.9.T45 H363 2015 Browse related items Request

    Details

    Subject(s)
    Editor
    Restrictions note
    Includes bibliographical references and index.
    Contents
    • Applications and developments of thin film technology
    • Importance of the vacuum technology for thin film coatings
    • Evaporation in the vacuum
    • Basic principle of plasma physics
    • Gaseous phase and surface processes
    • Coating by cathode sputtering
    • Plasma treatment methods
    • Ion beam-supported procedures
    • Chemical Vapor Deposition (CVD)
    • Physical basics of modern methods of surface and thin film analysis
    • Measurements of thin layers during the coating
    • Measurements of thin layers after terminated coating process
    • Nanoparticle Films
    • Optical properties of thin films.
    ISBN
    • 9783642054297
    • 3642054293
    LCCN
    2015934012
    OCLC
    913832246
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